The NicoletTM ECOTM/RS FT-IR Semiconductor Wafer Profiling System is ideally suited for research and development in semiconductor wafer manufacturing. The ECO/RS 300 is commonly used for measuring dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional Carbon and interstitial oxygen levels in silicon wafers. The ECO/RS 300 can be used with wafers ranging from slugs and pieces to 300 mm in diameter.
Wide variety of powerful quantitative algorithms supporting: • linear regression • classical least squares (CLS) • partial least squares (PLS)
Capable of measuring epitaxial film thickness from 300 nm to 7,500 nm
On board self diagnostics
Powerful FT-IR software toolkit for custom recipe development
Extremely reliable
Flexible measurement options from single point measurements to complete wafer mapping options
Transmission and reflectance measurement capability to accommodate the widest range of materials and films
Support of both ASTM and JEIDA standards for measurement of substitutional carbon and interstitial oxygen
The ECO/RS 300 maintains the low cost of ownership and high reliability of our long-running series of FT-IR products. Founded on our base of expertise in FT-IR technology, the ECO/RS 300 is also at the top of its class in performance. Thermo is committed to offering the most expertise and the best possible tools for FT-IR metrology. The ECO/RS 300 is another affirmation of this commitment.
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